MBE Crucible
Main Features:
1. Large crucibles can be produced (maximum diameter 12 inches, maximum height 17 inches).
2.High density (up to 2.2 g/cm³).
3. High purity (>99.99%).
4. Not prone to cracking (high interlayer strength).
Product Overview: Molecular Beam Epitaxy (MBE) is one of the methods used for producing Gallium Arsenide (GaAs) epitaxial wafers. This method can produce epitaxial materials with various structures, including multi-layer, homogeneous, heterogeneous, superlattices, and quantum wells. The crystal purity is high, and the chemical stability is good.
Product Applications:
Mainly used for the synthesis of semiconductor single crystals and III-V compound semiconductors via the MBE method.